Direct Patterning of Organic Functional Polymers through Conventional Photolithography and Noninvasive Cross-Link Agents

SQUILLACI, Marco, QUI, Feng, ALIPRANDI, Alessandro, ZHANG, Fan, FENG, Xinliang et SAMORI, Paolo, 2016. Direct Patterning of Organic Functional Polymers through Conventional Photolithography and Noninvasive Cross-Link Agents. Advanced Materials [en ligne]. 6 mai 2016. [Consultésans date]. DOI 10.1002/adma.201600329. Consulté de : http://onlinelibrary.wiley.com/wol1/doi/10.1002/adma.201600329/fullA new technique for direct patterning of functional organic polymers using commercial photolithography setups with a minimal loss of the materials' performances is reported. This result is achieved through novel cross-link agents made by boron- and fluorine-containing heterocycles that can react between themselves upon UV- and white-light exposure.1. .
Accès libre Peer reviewed
Version acceptée pour publication (post-print auteur)
Paternité - Pas d'utilisation commerciale [CC] [BY] [NC]
Auteurs Marco Squillaci
Feng Qui
Alessandro Aliprandi
Fan Zhang
Xinliang Feng
Paolo Samori
Unité de recherche du site

Institut de Science et d'Ingénierie Supramoléculaires - ISIS - UMR7006
URL éditeur http://onlinelibrary.wiley.com/wol1/doi/10.1002/adma.201600329/full
Langue

en
Volume

28
Numéro

26
Page de début

5249
Page de fin

5254
Date de première publication

2016-05-06
ISSN

0935-9648
Titre de la source (revue, livre…)

Advanced Materials
Résumé

A new technique for direct patterning of functional organic polymers using commercial photolithography setups with a minimal loss of the materials' performances is reported. This result is achieved through novel cross-link agents made by boron- and
Show moreA new technique for direct patterning of functional organic polymers using commercial photolithography setups with a minimal loss of the materials' performances is reported. This result is achieved through novel cross-link agents made by boron- and fluorine-containing heterocycles that can react between themselves upon UV- and white-light exposure.
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DOI 10.1002/adma.201600329
Type de publication

ACL
Domaine

Chimie/Matériaux
Mots-clés

photoresist
boron-cored chromophore
patterning
Unité de recherche extérieure au site

School of Chemistry and Chemical Engineering, Shanghai Jiao Tong University, Shanghai, P. R. China
Center for Advancing Electronics Dresden (CFAED) and Department of Chemistry and Food Chemistry, Technische Universität Dresden,
Fonction

aut
crp
Audience

International