Direct Patterning of Organic Functional Polymers through Conventional Photolithography and Noninvasive Cross-Link Agents

Onglets principaux

Squillaci, M., Qui, F., Aliprandi, A., Zhang, F., Feng, X., & Samori, P. (2016). Direct Patterning of Organic Functional Polymers through Conventional Photolithography and Noninvasive Cross-Link Agents. Advanced Materials. doi:10.1002/adma.201600329
PDF
Titre / Title

Direct Patterning of Organic Functional Polymers through Conventional Photolithography and Noninvasive Cross-Link Agents
Licence CC / CC licence

Paternité - Pas d'utilisation commerciale [CC] [BY] [NC]
Version / Version

Version acceptée pour publication (post-print auteur)
Auteurs / Authors Marco Squillaci
Feng Qui
Alessandro Aliprandi
Fan Zhang
Xinliang Feng
Paolo Samori
Unité de recherche du site / Intern department

Institut de Science et d'Ingénierie Supramoléculaires - ISIS - UMR7006
URL éditeur / URL publisher http://onlinelibrary.wiley.com/wol1/doi/10.1002/adma.201600329/full
Langue / Language

en
Volume / Volume

28
Numéro / Issue

26
Page de début / Start Page

5249
Page de fin / End Page

5254
Date de première publication / Date Issued

2016-05-06
ISSN

0935-9648
Titre de la revue/du livre/de la source / Journal/book/host title

Advanced Materials
Résumé / Abstract

A new technique for direct patterning of functional organic polymers using commercial photolithography setups with a minimal loss of the materials' performances is reported. This result is achieved through novel cross-link agents made by boron- and
Show moreA new technique for direct patterning of functional organic polymers using commercial photolithography setups with a minimal loss of the materials' performances is reported. This result is achieved through novel cross-link agents made by boron- and fluorine-containing heterocycles that can react between themselves upon UV- and white-light exposure.
Show less
DOI 10.1002/adma.201600329
Type de publication / Publication Type

ACL
Domaine / Topic

Chimie/Matériaux
Mots-clés / Keywords

photoresist
boron-cored chromophore
patterning
Unité de recherche extérieure au site / Extern department

School of Chemistry and Chemical Engineering, Shanghai Jiao Tong University, Shanghai, P. R. China
Center for Advancing Electronics Dresden (CFAED) and Department of Chemistry and Food Chemistry, Technische Universität Dresden,
Fonction / Role

aut
crp
Audience / Audience

International