Direct Patterning of Organic Functional Polymers through Conventional Photolithography and Noninvasive Cross-Link Agents

Accès libre Peer reviewed | |
---|---|
Version acceptée pour publication (post-print auteur) | |
Paternité - Pas d'utilisation commerciale [CC] [BY] [NC] | |
Auteurs |
Marco Squillaci Feng Qui Alessandro Aliprandi Fan Zhang Xinliang Feng Paolo Samori |
Unité de recherche du site |
Institut de Science et d'Ingénierie Supramoléculaires - ISIS - UMR7006 |
Langue |
en |
Volume |
28 |
Numéro |
26 |
Page de début |
5249 |
Page de fin |
5254 |
Date de première publication |
2016-05-06 |
ISSN |
0935-9648 |
Titre de la source (revue, livre…) |
Advanced Materials |
Résumé |
A new technique for direct patterning of functional organic polymers using commercial photolithography setups with a minimal loss of the materials' performances is reported. This result is achieved through novel cross-link agents made by boron- and Show moreA new technique for direct patterning of functional organic polymers using commercial photolithography setups with a minimal loss of the materials' performances is reported. This result is achieved through novel cross-link agents made by boron- and fluorine-containing heterocycles that can react between themselves upon UV- and white-light exposure. Show less |
DOI | 10.1002/adma.201600329 |
URL éditeur |
http://onlinelibrary.wiley.com/wol1/doi/10.1002/adma.201600329/full |
Type de publication |
ACL |
Topic |
Chimie/Matériaux |
Mots-clés |
photoresist |
Unité de recherche extérieure au site |
School of Chemistry and Chemical Engineering, Shanghai Jiao Tong University, Shanghai, P. R. China |
Fonction |
aut |
Identifiant idREF |
109288335 |
Audience |
International |
URL | https://univoak.eu/islandora/object/islandora:55002 |