Atmospheric Plasma Deposition Process: A Versatile Tool for the Design of Tunable Siloxanes-Based Plasma Polymer Films

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PETERSEN, Julien, BECHARA, Rony, BARDON, Julien, FOUQUET, Thierry, ZIARELLI, Fabio, DAHERON, Laurence, BALL, Vincent, TONIAZZO, Valérie, MICHEL, Marc, DINIA, Aziz et RUCH, David, 2011. Atmospheric Plasma Deposition Process: A Versatile Tool for the Design of Tunable Siloxanes-Based Plasma Polymer Films. Plasma Processes and Polymers [en ligne]. 2011. Vol. 8, n° 10pp. 895-903. [Consultésans date]. DOI 10.1002/ppap.201100022. Consulté de : http://dx.doi.org/10.1002/ppap.2011000221. .
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Auteurs Julien Petersen
Rony Bechara
Julien Bardon
Thierry Fouquet
Fabio Ziarelli
Laurence Daheron
Vincent Ball
Valérie Toniazzo
Marc Michel
Aziz Dinia
David Ruch
Unité de recherche du site Biomatériaux et bioingénierie - BB - UMRS1121
Institut de Physique et Chimie des Matériaux de Strasbourg - IPCMS - UMR7504
Langue

en
Volume

8
Numéro

10
Page de début

895
Page de fin

903
Date de première publication

2011
ISSN

1612-8850
Titre de la source (revue, livre…)

Plasma Processes and Polymers
Résumé

This paper aims at describing the synthesis of plasma polymer films by means of atmospheric filamentary plasma dielectric barrier discharge. This work highlights the fact that molecular structures of siloxane based plasma films can be tuned according
Show moreThis paper aims at describing the synthesis of plasma polymer films by means of atmospheric filamentary plasma dielectric barrier discharge. This work highlights the fact that molecular structures of siloxane based plasma films can be tuned according to the so-called Yasuda's parameter, which corresponds to the W/F ratios (W = power discharge; F = Monomer flow rate). Indeed, we showed that the plasma films exhibit a polydimethylsiloxane (PDMS) structure when W/F was low (i.e. when low plasma energy is applied), whereas SiOx structures were rather obtained when W/F is high (i.e. high plasma energy). These results were validated thanks to a wide set of analytical tools allowing to identify two domains where molecular structures of the plasma films swiftly progress from PDMS to SiOx according to W/F ratios.
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DOI 10.1002/ppap.201100022
Éditeur

Wiley-VCH Verlag
URL éditeur http://dx.doi.org/10.1002/ppap.201100022
Type de publication

journal article
Type de publication

ACL
Domaine

Aucun
Équipes de recherche

E5 - DCMI : Département de chimie et des matériaux inorganiques
Fonction

aut
Identifiant idREF 096360704
059840633
Audience

Non spécifiée
URL https://univoak.eu/islandora/object/islandora:60587