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Organosilicon Coatings Deposited in Atmospheric Pressure Townsend Discharge for Gas Barrier Purpose: Effect of Substrate Temperature on Structure and Properties
Enhanced Adhesion over Aluminum Solid Substrates by Controlled Atmospheric Plasma Deposition of Amine-Rich Primers
Dopamine-Melanin Film Deposition Depends on the Used Oxidant and Buffer Solution
Atmospheric Plasma Deposition Process: A Versatile Tool for the Design of Tunable Siloxanes-Based Plasma Polymer Films

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